Silicon Photonic Waveguides and Devices for Near- and Mid-IR Applications

Silicon photonics has been a very buoyant research field in the last several years mainly because of its potential for telecom and datacom applications. However, prospects of using silicon photonics for sensing in the mid-IR have also attracted interest lately. In this paper, we present our recent results on waveguide-based devices for near- and mid-infrared applications. The silicon-on-insulator platform can be used for wavelengths up to 4 μm; therefore, different solutions are needed for longer wavelengths. We show results on passive Si devices such as couplers, filters, and multiplexers, particularly for extended wavelength regions and finally present integration of photonics and electronics integrated circuits for high-speed applications

Very low energy implanted Bragg gratings in SOI for wafer scale testing applications

We present Bragg gratings with an effective index change introduced by implanting germanium at only 15KeV. An extinction ratio of 35dB at 1350nm is demonstrated for device lengths of 600µm, furthermore laser annealing is demonstrated

Ge Ion Implanted Photonic Devices and Annealing for Emerging Applications

Germanium (Ge) ion implantation into silicon waveguides will induce lattice defects in the silicon, which can eventually change the crystal silicon into amorphous silicon and increase the refractive index from 3.48 to 3.96. A subsequent annealing process, either by using an external laser or integrated thermal heaters can partially or completely remove those lattice defects and gradually change the amorphous silicon back into the crystalline form and, therefore, reduce the material’s refractive index. Utilising this change in optical properties, we successfully demonstrated various erasable photonic devices. Those devices can be used to implement a flexible and commercially viable wafer-scale testing method for a silicon photonics fabrication line, which is a key technology to reduce the cost and increase the yield in production. In addition, Ge ion implantation and annealing are also demonstrated to enable post-fabrication trimming of ring resonators and Mach–Zehnder interferometers and to implement nonvolatile programmable photonic circuits